Laboratory, Optical And Precision Equipments (Excl. Glasses) – Wdh - Maskless Aligner. The Leibniz Institute For Photonic Technologies E.V. Is Tendering For A Maskless Aligner For Photolithography, Which Is To Be Used For The Maskless Exposure Of Photoresist Layers On Different Substrates From Single Chips To 150 Mm Wafers. The Central Requirements For The System Are Structure Resolutions Of Up To 600 Nm Line Width (Cd) In The Resist, Precise Multi-Level Alignment With Up To 250 Nm Coverage Accuracy And Writing Speeds That Enable Exposure Numbers Of At Least 1000 Wafers Per Year.
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